Heidelberg Instruments DWL66 Laser Photolithography System
Description
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Usage Policy
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Contact
| Name |
Office |
Extension |
Email |
| Peter Gilgunn |
HH 1209 |
Link |
Link |
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Qualified Users List
| Name |
Office |
Extension |
Email |
| Mask Writing Only |
| Fernando Alfaro |
|
Link |
Link |
| Sarah Bedair |
HH 1209 |
Link |
Link |
| George Lopez |
|
Link |
Link |
| Yonduck Sang |
|
|
|
| Li Wang |
|
|
|
| Jui-Min Yang |
|
|
|
| Bohzi Yang |
|
|
|
| Yongjun (Jay) Zhao |
|
|
|
| Mask Writing and Chip Lithography |
| Chiung-Cheng Lo |
HH A212 |
Link |
Link |
| Amy Wung |
HH 1209 |
Link |
Link |
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Standard Operating Procedures
General Operating Procedures
User Guide 1
User Guide 2
Conversion Software Guide
Grayscale Guide
Appendix A Gerber
Appendix B Cif
Appendix C GDSII
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Application Notes
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Useful Links
Thick Film Lithography Using Laserwrite
Laser Beam Direct Write Lithography
Design rules for DWL mask generation from
Princeton
Additional information from the MEMS Lab Intranet
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Miscellaneous
- Fang Chen oversaw the installation of a new stage in Oct 2004, and suggested that:
- Avoid moving the stage by hand when loading your masks
- Platen is now good for 3 and 4 inch masks and so does not need
to be changed frequently
- For mask writing, all you need to do behind the glass is put
your mask down in the center of the plate, select the filter and
start writing
- George Lopez noted a decreased laser power output in April 2005.
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