Indel Evaporation/Sputtering System

The Indel is a single source/target vacuum system equipped for either thermal evaporation or DC plasma sputtering.


Description

The Indel SS1 vacuum system is used for either thermal evaporation or DC
plasma sputtering.  It has a base pressure around 5 uTorr under
turbomolecular vacuum.  In sputter mode, a single sputter gun is
available for 3" targets.  The power supply can maintain about 250 watts
input power (1A max), and the wafer stage can be spun mechanically for
even deposition.  5 mTorr to 20 mTorr are conventional sputter
pressures, with argon as the ambient gas.  A shutter is also available
for pre-sputtering.  In thermal evaporation mode, one boat can be loaded
for resistive heating up to 50A on the current meter, with a circuit
breaker to protect from extreme overheating.  The wafer is water cooled
on its stage.

 

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Usage Policy

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Contact

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Office:

 

Extension:

 

Email:

 

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Qualified Users List

Name

Office

Extension

Email

 

 

 

 

 

etc.

 

 

 

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Standard Operating Procedures

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Applications Notes

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Useful Links

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Miscellaneous

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