CMU MEMS Laboratory Publication Abstract


in Applied Physics Letters, Volume 74, Number 25, pp. 3902-3903, June 1999.
Writing nanometer-scale pits in sputtered carbon films using the scanning tunneling microscope
S. C. Eagle and G. Fedder
A reproducible method of the formation of pits in a sputtered carbon surface with a platinum-iridium tunneling tip is presented for possible use in lithography or data storage applications. Thin carbon films are sputtered on top of chrome and gold metallic underlayers on a silicon substrate. Overall surface roughness of the carbon films is under 3 Å. Holes are produced in the carbon film by applying short voltage pulses ~4–8 V in height, 250 ns–100 µs in length! across the tunneling gap. An array of holes written in the carbon demonstrate reproducibility and the feasibility of using this multilayered structure in a data storage system.
© 1999 American Institute of Physics. All rights reserved. No claim is made to original U.S. Government works.
Full paper not available from outside CMU

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