CMU MEMS Laboratory Publication Abstract


in Proceedings of the 16th IEEE International Conference on Microelectromechanical Systems (MEMS), pp. 165-168, January 19-23, 2003, Kyoto, Japan.
Micromachined On-Chip Inductor Performance Analysis
X. Zhu, R. Groves, S. Subbana, D. Jadus, T. Mukherjee and G. Fedder
Based on measurements of inductors fabricated in the IBM SiGe process with different add-on process modules, a Moments EM field simulator is used to predict inductor performance in the entire process space of different fabrication techniques, which are chosen to improve the quality factor of inductors. These fabrication techniques include different metal thickness, different wafer resistivity, a polyimide spacer and an air spacer as a thick dielectric layer (up to 200 µm). The simulated inductors range from 0.1nH straight line designs to 5 nH spiral designs.
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Full paper (PDF) (opens in new window).

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