October 24, 2005
On October 4, 30 members of local economic development organizations and foundations toured the Carnegie Mellon Nanofabrication Facility as part of a presentation on technology transfer to the private sector.
The tour was conducted by ECE Professor Jim Bain, and highlighted the unique capabilities of the nanofabrication facility. These include focused ion beam etching of 30 nm structures using a 5 nm beam of Ga ions, the electron beam lithography system, which can pattern structures of 35 nm in diameter over a wide area, and the deep reactive ion etching system. This latter system can etch high aspect ratio structures in Si for MEMS applications. An additional focus of the tour was the increasing number of local companies (currently seven) that are using the facility in their research and development.
Participating in the tour were representatives of Innovation Works, the Idea Foundry, and the Technology Collaborative, as well as the Heinz Endowments, the McCune Foundation, and the Claude Worthington Benedum Foundation. The outreach effort was designed to raise the local business community's awareness of the technology and collaboration opportunities available at Carnegie Mellon University.